Facility

1.7 MV Tandem Accelerator

RF Ion Source for He ion beam and Sputtering Negative Ion Source for other types of ions.

 

Terminal voltage of 0.1-1.7 MV, proton energy beam of 0.2-3.4 MeV.

 

Heaviest Ion - Bi

 

Highest Energy tried - 16.5 MeV

 

Beam Current - 1 - 100 micro-amp

 

200 kV Ion Implanter

Terminal voltage of 0-200 kV

 

Type of ions - proton - Bi

 

Beam Current - 1 - 10 micro-amp

 

Gas Cluster Ion Beam System

Terminal voltage of 0-30 kV

 

Cluster ions ~ 1000 - 3000 atoms Ar

 

Beam Current - 100 nano-amp to 1 micro-amp

 

Other Instruments

 

Atomic Force Microscope

 

Sputter deposition System

 

Thermal Annealing system

 

Rapid Thermal Annealing System

 

Optical Spectroscope

 

 

User Facilities

 

Texas Center for Superconductivity Facilities

 

Nano Fabrication Laboratory