A method for massively parallel writing of nano-patterns using ion-focusing optics on the substrate and fabricated by standard lithography and etching methods. It can be used for etching or deposition of nano-structured materials and could make virtually any 2-dimensional pattern or 3-dimensional shape.
Self-aligned process. Immune from vibrations. 100-fold reduction in size over state of the art lithography limits. Could make virtually any 2-dimensional pattern or 3-dimensional shape.
Nano-integrated circuits, memory devices or sensors.